Sintered Gold(Au) Bonding Technology: AuRoFUSE™ Preform

Consumer Electronics Paste Semiconductors Joining and Sealing (Packaging) Joining Materials
Sintering Au bonding technology: AuRoFUSE™ Preforms

What is "AuRoFUSE™ Preform"?
This is an Au sintering bonding technology for high-density packaging that utilizes AuRoFUSE™, a low-temperature sintering paste for gold-gold bonding developed by TANAKA. It contributes to efficient packaging processes and high reliability of bonding, and has high-performance properties such as electrical resistance of 4.5µΩ·cm and thermal conductivity of 200W/m·K.

Technical Information on AuRoFUSE™ Preforms

Sintered Au bonding technology for high-density mounting using AuRoFUSE™

In this technology, the bonding material is dried prior to bonding to eliminate fluidity, which suppresses creeping and minimizes spreading in the horizontal direction, thereby allowing fine-pitch bonding. So far, bumps of 5 µm have been successfully formed, and this technology is expected to be used as a bonding technology for flip-chip bonding that require high-density mounting.

Features

  1. ①Can produce Au bumps of various sizes and shapes
    (smallest size formable: 5 µm size, 5 µm pitch)
  2. ② Has excellent compression deformability as it is a bonding material with porous structure
  3. ③ High-density mounting is possible due to minimal deformation in the horizontal direction during compression
  4. ④ Oxidation and migration are unlikely as the main component is Au
  5. ⑤ Bonding is possible at comparatively low temperatures (from 200℃) and air atmosphere
① Free design of shapes
SEM images of bumps of various sizes with free shape design
② High compressibility
High Compressibility_Description of SEM Image
③ Bump arrangement in narrow gaps
Top SEM image of high-density mounting

③ Shape Deformation rate when bonding pressure is increased

Image showing the direction of compression
Shape Change Rate Graph

Expected applications

Die-bonding materials for optical semiconductors (LED and LD), power semiconductors, ICs

Manufacturing of AuRoFUSE™ Preforms

Manufacturing of AuRoFUSE™ Preforms
  1. ① Perform metallization using Au/Pt/Ti as a base layer on the substrate to be bonded
  2. ② Apply photoresist to the substrate for bonding after metallization
  3. ③ Place a photomask that matches the preform shape over the substrate to be bonded, and perform exposure and development to create a resist frame.
  4. ④  Flowing of AuRoFUSE™ into the formed resist frame
  5. ⑤ Vacuum-dry at room temperature, and after drying, scrape off excess Au particles with a squeegee.
  6. ⑥ Temporary sintering through heating, followed by separation and removal of the resist frame

Comparison of AuRoFUSE™ Preforms and Other Materials

(〇) AuRoFUSE™ Preforms

  • Drying the paste before bonding to eliminate fluidity can suppress lateral spreading and enable high-density mounting.
  • Being a porous structure, it can be easily deformed, allowing bonding even when there are differences in height between electrodes, warpage of substrates, and differences in thickness.

(△) Soldering materials

  • As bump pitch becomes finer, solder materials spread laterally when melted, which can cause a short circuit due to contact between electrodes.

(△) Electroless plating

  • Can achieve narrow pitch, but requires relatively high pressure during bonding, which can lead to chip damage
Comparison of AuRoFUSE™ Preforms and Other Materials
AuRoFUSE™ Preforms do not spread laterally outward and are softer than plating bumps.

Example of bonding: Flip-chip bonding

Example of Flip Chip Bonding Using AuRoFUSE™ Preforms
Recommended condition
Pretreatment: UV ozonation, etc.
Thermo-Compression: 200℃, 20MPa, 10sec.
Post-Bake: 200℃, 60min.

Characteristics

AuRoFUSE™ preform_200℃, 20MPa, 10sec
Electrical resistivity (µΩ·cm) 4.5
Thermal conductivity (W/mK) 200
Young's modulus (GPa) 57
Shear strength (MPa) >30
Coefficient of Liner Thermal Expansion (CTE) (ppm/K) 14
Under Barrier Metal Au/Pt/Ti, Au/Pd/Ni

Related Information

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