High-purity Materials for Evaporation, Bonding, and Sealing

High-purity Materials for Evaporation, Bonding, and Sealing

High-purity Materials for Evaporation, Bonding, and Sealing product image

We offer a wide variety of high quality products.

Various bonding and sealing materials for precision parts, including evaporation materials for semiconductor devices are available.
We also have a lineup of SJeva, a high-quality Au deposition material with higher Au quality than earlier products. It contributes to higher productivity and lower costs for micro-wiring and medical equipment applications.

High-purity Materials for Evaporation, Bonding, and Sealing Overview

Features

  • Gold and gold alloys are available in wire, ribbon, pellet, block, and ball forms.
  • Reduced trapped air and oxidized additives
Typical Compositions and Shapes
Item Shape
Wire Ribbon Pellet Block Ball
Au (99.99% , 99.999% )
AuSb1.0
AuZn5.0
AuSi3.15
AuBe1.0
AuGe12.5
AuSn20

・Compositions other than listed those above are available.
・AuSn deposition materials can be manufactured in a wide composition range of AuSn18% to 30%.

Application

Die bonding, wafer evaporation, bonding, sealing, etc.

Gold alloy series

  • Wire
    Gold alloy series_Wire
  • Ribbon
    Gold alloy series_Ribbon
  • Pellet
    Gold alloy series_Pellet
  • Block
    Gold alloy series_Block

Au-Ge ball
Au-Ge ball

High-quality Au deposition material: Sjeva

High-quality Au deposition material: SJeva (granules) product image
SJeva (granules)

Contributes to higher productivity and lower costs of products for semiconductors and medical equipment

Because it contains extremely few non-metallic inclusions compared to current products, it makes it possible to reduce the amount of precious metals used, increase productivity and cut costs by reducing processing, and raise recoverability and recyclability.

Features

  • Oxides, sulfides, and other non-metallic materials present in the deposition material are reduced compared to earlier products
  • Eliminates the need for a cleaning process due to reduced contaminants that collect on the surface during melting of the deposition material
  • Shortens the preheating time before film formation and reduces the consumption of deposition material that does not contribute to film formation
  • Reduces splash phenomenon from the deposition source during film formation, which reduces the number of particles that form on substrates during high-rate deposition

Contributes to higher end-user productivity and lower costs for micro-wiring and MEMS in the semiconductor fields as well as optical devices, LEDs, and medical equipment

SEM photo

  • Before melting
    SJeva SEM photo: before melting
  • After melting
    SJeva SEM photo: after melting