CVD/ALD Precursors
CVD = Chemical Vapor Deposition
ALD = Atomic Layer Deposition
Development of high-purity precursors for next-generation semiconductors.
Development and Provision of Precursors
TANAKA has developed various types of chemical vapor deposition (CVD) and atomic layer deposition (ALD) precursors. With CVD systems for producing thin semiconductor films and providing various analyzers data for evaluating thin films(field emission scanning electron microscope [FE-SEM], atomic force microscope [AFM], glow-discharge mass spectrometer [GD-MS], etc.), TANAKA offers precursors that are ideal for a variety of different purposes.
Examples of precursor products (ruthenium)
We develop precursors for precious metals, primarily focusing on ruthenium.
| Product Name | Structure |
|---|---|
|
Carish Ru liquid precursor |
|
|
TRuST Ru liquid precursor |
|
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DCR Ru solid precursor |
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![[Vapor pressure comparison graph] Carish, TRuST, DCR](https://prod-cms-cache-bucket.s3-ap-northeast-1.amazonaws.com/wp-content/uploads/sites/images/ex/en/products/images/a06/img_block02_01.png)